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采用NbSi复合靶,通过调节Nb与Si的比例,利用磁控溅射射频工艺,在单晶硅片上沉积不同Si含量的NbSiN纳米复合膜。利用X射线衍射仪、纳米压痕仪和高分辨透射电镜等,研究了Si含量对NbSiN纳米复合膜的微观结构和力学性能的影响。结果表明:随着薄膜中Si含量的增加,其结晶程度先升高,然后降低,硬度和弹性模量先增加后降低,当n(Si):n(Nb)=5:20时,NbSiN薄膜硬度和弹性模量均达到最大值33.6和297.2 GPa。微观组织观察表明,此时NbSiN薄膜内部形成Si_3N_4界面相包裹NbN纳米晶粒的纳米复合结构,Si_3N_4界面相呈结晶态协调相临NbN纳米晶粒间的位向差,并与NbN纳米晶粒之间形成共格外延生长,其微结构可用nc-NbN/c-Si_3N_4模型来表示,表明其超硬效应源于NbN基体相和Si_3N_4界面相之间形成的共格外延生长界面。
By using NbSi composite target, the NbSiN nanocomposite films with different Si contents were deposited on the monocrystalline silicon wafer by adjusting the ratio of Nb to Si by magnetron sputtering radio frequency technology. The effects of Si content on the microstructure and mechanical properties of NbSiN nanocomposite films were investigated by X-ray diffraction, nanoindentation and high-resolution transmission electron microscopy. The results show that the crystallinity increases first and then decreases with the increase of Si content in the film, and the hardness and elastic modulus increase and then decrease. When n (Si): n (Nb) = 5:20, NbSiN film Both hardness and elastic modulus reached the maximum of 33.6 and 297.2 GPa. Microstructure observation shows that the NbSiN thin film at this time formed within the Si_3N_4 interface phase wrapped NbN nanocrystalline nano-composite structure, Si_3N_4 interface phase was coordinated crystallization adjacent NbN nanocrystal orientation difference, and NbN nano-crystal grain The microstructures can be expressed by the nc-NbN / c-Si_3N_4 model, indicating that the superhard effect originates from the coherent epitaxial growth interface formed between the NbN matrix phase and the Si_3N_4 interface phase.