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为了揭示Ti_Si_N复合膜中Si3N4界面相的存在方式及其对薄膜力学性能的影响,采用x射线衍射仪、高分辨透射电子显微镜、俄歇电子能谱仪和显微硬度仪对比研究了磁控溅射Ti_Si_N复合膜和TiN/Si3N4多层膜的微结构和力学性能.实验结果表明,Ti_Si_N复合膜均形成了Si3N4界面相包裹TiN纳米晶粒的微结构.其中低Si含量的Ti_Si_N复合膜中Si3N4界面相的厚度小于1nm,且以晶体态存在,薄膜呈现高硬度.而高Si含量的Ti_Si_N复合膜中的Si3N4界面相以非晶态存在,薄膜的硬度也相应降低.显然,Ti_Si_N复合膜中Si3N4界面相以晶体态形式存在是薄膜获得高硬度的重要微结构特征,其强化机制可能与多层膜的超硬效应是相同的.
In order to reveal the existence mode of Si3N4 interfacial phase in Ti_Si_N composite film and its influence on the mechanical properties of the film, the influences of magnetron sputtering (ICP-AES), X-ray diffraction, high resolution transmission electron microscopy, Auger electron spectroscopy and microhardness tester Ti_Si_N composite films and TiN / Si3N4 multilayers.The experimental results show that the microstructures of TiNiNN coated with Si3N4 are formed on the Ti_Si_N composite films, among which Si3N4 The thickness of the interface phase is less than 1nm, and exists in the crystalline state, the film presents a high hardness, while the Si3N4 interface phase in the high Si content Ti_Si_N composite film exists in amorphous state, the hardness of the film is also reduced accordingly.Obviously, Ti_Si_N composite film The existence of Si3N4 interface phase in crystalline state is an important micro-structural feature of high hardness of the film. The strengthening mechanism may be the same as the superhard effect of multi-layer film.