论文部分内容阅读
本文基于聚二甲基硅氧烷(PDMS)微结构图章的转印技术将紫外固化胶图形转移到PMMA基底上,形成紫外固化胶/PMMA双层胶结构,用等离子刻蚀(RIE)后,得到具有内切结构的光刻胶掩膜,镀金属膜并去胶获得周期性微纳结构。由于界面间粘附能的差异,紫外固化胶图形可以在无粘附剂辅助下成功转移到PMMA基底上。比较PMMA和这种紫外固化胶在氧气等离子中的刻蚀速率,表明紫外固化胶在氧气等离子体中具有高抗刻蚀性,有利于底层的PMMA形成去胶所需的内切结构。
In this paper, the UV curable adhesive is transferred onto the PMMA substrate based on the transfer technology of the polydimethylsiloxane (PDMS) micro-structure stamp, and the UV curable adhesive / PMMA double-layer adhesive structure is formed. After plasma etching (RIE) A photoresist mask with an inscribed structure is obtained, a metal-plated film is removed, and a periodic micro / nano structure is obtained by de-gluing. Due to the difference in the interfacial adhesion energy, the UV curable adhesive pattern can be successfully transferred to the PMMA substrate without the aid of an adhesive. Comparison of the etching rate of PMMA with this UV curable adhesive in oxygen plasma indicates that the UV curable adhesive has a high resistance to etching in the oxygen plasma and is conducive to the formation of the internal structure required for delamination of the underlying PMMA.