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基于已获得15mA的15～20mA直流负氢多峰离子源,为了进一步提高负氢离子束流强和减少发射度,采取了以下两个措施:1)在原有的负氢多峰离子源的基础上把离子源的腔体长度增加;2)在负氢多峰离子源上盖处向放电腔内通入铯蒸汽。如图1所示,负氢多峰离子源腔体长度由原来的152mm增加到228mm,高度增加了三分之一,其中外筒和弹夹间采用慢走丝线切割,高度增加后,使线切割的难度增加,而且线切割后使弹夹发生变形,后续又通过磨削进行矫形。如图2所示,在负氢多峰离子源上盖处增加了1个铯锅装置向离子源的等离子腔内供用铯蒸汽,
Based on 15mA to 20mA dc negative hydrogen multimodal ion source with 15mA, in order to further improve the negative ion beam current and decrease the emittance, the following two measures have been taken: 1) Based on the original negative ion hydrogen multimodal ion source Increase the cavity length of the ion source; 2) Pass cesium vapor into the discharge chamber at the lid of the negative-ion multi-peak ion source. As shown in FIG. 1, the length of the negative ion multi-peak ion source cavity increases from the original 152 mm to 228 mm, and the height increases by one third. The distance between the outer cylinder and the magazine is slow wire cutting. After the height increases, Increasing the difficulty of cutting, and deformation of the magazine after wire cutting, followed by orthopedic grinding. As shown in Fig. 2, a cesium pot device is added to the cover of the negative hydrogen multimodal ion source to supply cesium vapor into the plasma chamber of the ion source,