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为了制备结构规整、长度可控的金属Ni亚微米阵列,以多孔阳极氧化铝(AAO)为模板,采用直流电沉积法进行了Ni亚微米阵列的制备研究,并利用SEM,TEM,XRD等测试手段对其微观形貌和结构进行了表征。结果表明:此法制得的Ni亚微米阵列结构规整、直径与模板孔径基本一致,约为250 nm,是结构紧密的多晶体。并通过控制电沉积的时间,制备出不同长度的Ni纳米线,讨论了电沉积时间对纳米线长度的影响。
In order to prepare a structured and controlled metal Ni submicron array with porous anodic aluminum oxide (AAO) as a template, Ni submicron arrays were prepared by direct current deposition method. SEM, TEM, XRD and other testing methods Its microstructure and structure were characterized. The results show that the structure of Ni submicron arrays prepared by this method is regular and the diameter is basically the same with that of the template, about 250 nm. It is a polycrystal with compact structure. By controlling the time of electrodeposition, Ni nanowires with different lengths were prepared, and the influence of electrodeposition time on nanowire length was discussed.