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本文介绍了几种薄膜冶金方法的使用。叙述了电子束共蒸发技术在蓝宝石表面上制备Nb_3Ge薄膜,辉光放电制备非晶硅太阳能电池光电薄膜,空心阴极放电法制取TiN薄膜和离子注入制备半导体器件薄膜的工艺及其对镀薄装置提出的要求。
This article describes the use of several thin film metallurgy methods. The article describes the technology of e-beam co-evaporation on the surface of sapphire to prepare Nb_3Ge thin film, glow discharge amorphous silicon solar cell photovoltaic film, hollow cathode discharge method for preparing TiN thin film and ion implantation process for preparing semiconductor device thin film device Request.