研究了照明光瞳非对称性对光刻成像质量的影响。通过PROLITH软件计算了环形与四极照明条件下,光瞳非对称性对图形位置偏移量、曝光图形内水平线条与垂直线条的宽度差、曝光图形上密集线条与孤立线条之间线宽偏差的影响。研究结果表明,光瞳非对称性主要影响曝光图形的位置偏移量,光瞳非对称性引起的图形位置偏移量与光瞳非对称性的大小成线性关系。根据套刻精度的误差分配原则,计算得到光瞳非对称性的容限为5%。 The influence of illumination pupil asymmetry on lithography imaging quality was studied. Through the PROLITH software, the deviation of pupil asymmetry on the position of the image, the width difference between the horizontal line and the vertical line in the exposure pattern, the line width deviation between the dense line and the isolated line on the exposure pattern are calculated by PROLITH software. Impact. The results show that the pupil asymmetry mainly affects the position offset of the exposure pattern, and the pupil asymmetry causes the position offset of the image to be linear with the pupil asymmetry. According to the principle of error distribution of overlay precision, the tolerance of pupil asymmetry calculated is 5%.