Morphologies of Cu(111) Rims on Si(111)-7×7 surfaces prepared at low temperature are investigated by scanning tunnelling microscopy (STM) and reflection high-energy electron diffraction (RHEED). At the initial growth stage, Cu 61ms are Bat due to the formation of silicide at the interface that decreases the mismatch between Cu films and the Si substrate. Different from the usual multilayer growth of Cu/Cu(111), on the silicide layer a layer-by-layer growth is observed. The two dimensional (2D) growth is explained by the enhanced high island density at low deposition temperature. Increasing deposition rate produces films with different morphologies, which is the result of Ostwald ripening.