用磁控溅射法制备了Fe N薄膜和Fe N/TiN多层膜。结果表明 ,在常温下 ,使用较小的氮、氩比溅射 ,生成的Fe N薄膜主要是含氮α Fe固溶体 ,并且N原子进入α Fe晶格是饱和磁化强度提高的一个原因。Fe N/TiN多层膜的层间耦合作用以及减小每一Fe N层厚度而引起的晶粒尺寸的减小可以有效地降低薄膜的矫顽力 ,从而获得更好的软磁性能 Fe N thin films and Fe N / TiN multilayer films were prepared by magnetron sputtering. The results show that, at room temperature, using smaller nitrogen and argon than sputtering, the resulting Fe N film is mainly nitrogen-containing α Fe solid solution, and N atoms into the α Fe lattice is one reason for the increase of saturation magnetization. The interlayer coupling effect of the FeN / TiN multilayered film and the reduction of the grain size caused by reducing the thickness of each FeN layer can effectively reduce the coercive force of the film to obtain better soft magnetic properties