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用磁控反应溅射的方法在不锈钢基片上制备了NbN／TaN纳米多层薄膜，试验采用X射线衍射仪（XRD）、透射电子显微镜（TEM）及显微硬度仪对薄膜的微结构和硬度进行分析，结果表明：在NbN／TaN多层膜中，NbN层为面心晶体结构，TaN层为六方晶体结构；NbN／TaN纳米多层膜存在超硬效应，在调制周期2．3～170nm这一放宽的范围内保持超高硬度，硬度最大值HK达51.0GPa
The NbN / TaN nano-multilayer films were prepared by magnetron reactive sputtering on stainless steel substrate. The microstructure and hardness of the films were characterized by X-ray diffraction (XRD), transmission electron microscopy (TEM) and microhardness tester The results show that the NbN / TaN multilayers have a face-centered crystal structure and the TaN layer has a hexagonal crystal structure. The super-hard NbN / TaN multilayers have a superhardness of 2.3 ~ 170nm This relaxed range to maintain ultra-high hardness, the maximum hardness HK up to 51.0GPa