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采用对向靶磁控溅射法在不同气压和Ar/O2流量比条件下,以氟化SnO2(FTO)导电玻璃为基底制备了多晶TiO2薄膜.台阶仪测量结果显示所制备TiO2薄膜的平均厚度约为200nm.随着溅射气压的升高,TiO2薄膜由锐钛矿与金红石混晶结构转变为纯锐钛矿结构.分别采用场发射扫描电镜(FESEM)和原子力显微镜(AFM)分析了不同气压和Ar/O2流量比对TiO2薄膜表面形貌的影响,结果显示TiO2薄膜的表面粗糙度随溅射总气压和Ar/O2流量比的增加而增大.以初始浓度为100×10-6(体积分数)的异丙醇(IPA)气体为目标物检测所制备TiO2薄膜的光催化性能,并分析该气相光催化反应的机理,在紫外照射条件下异丙醇先氧化为丙酮再被氧化为CO2.当总溅射气压为2.0Pa、Ar/O2流量比为1:1时,溅射所得TiO2薄膜具备最优光催化活性并可在IPA降解反应中保持较高的催化活性和稳定性.
Polycrystalline TiO2 thin films were prepared from fluorinated SnO2 (FTO) conductive glass substrates by using target-target magnetron sputtering at different gas pressures and Ar / O2 flow rates. The results of the step analyzer showed that the average With a thickness of about 200nm.With the increase of sputtering pressure, the TiO2 thin film changed from anatase to rutile mixed crystal structure to pure anatase structure.FTIEM and AFM were used to analyze the The results showed that the surface roughness of TiO2 film increased with the increase of sputtering total pressure and Ar / O2 flow rate.Under the initial concentration of 100 × 10- 6 (volume fraction) of isopropanol (IPA) gas was used as the target to detect the photocatalytic activity of the prepared TiO2 thin film. The mechanism of the photocatalytic reaction was analyzed. Under the condition of UV irradiation, isopropanol was first oxidized to acetone Oxidation to CO2. When the total sputtering pressure is 2.0Pa and the Ar / O2 flow ratio is 1: 1, the TiO2 film prepared by sputtering has the best photocatalytic activity and can maintain high catalytic activity and stability in IPA degradation reaction Sex.