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以聚苯乙烯-聚4-乙烯基吡啶(PS-b-P4VP)嵌段共聚物作为研究对象,采用DMF作为退火溶剂,以原子力显微镜(AFM)和透射电子显微镜(TEM)为表征手段,研究了溶剂退火后期溶胀薄膜中溶剂的去除速度对于薄膜相形貌的影响,发现通过改变溶剂去除速度可以有效的调控薄膜中的形貌.当薄膜厚度为35 nm时,DMF的快速挥发会导致薄膜中形成以PS为分散相的反转柱状相结构,当降低溶剂的挥发速度时,薄膜中形成了以PS为分散相的环状形貌,当进一步减缓挥发速度时,薄膜中将形成台阶状的片层结构;然而当薄膜厚度为55 nm时,溶剂退火后期薄膜中形成的是以P4VP为分散相的正常柱状相结构,在相同溶剂去除速度条件下薄膜相形貌变化较小.
Polystyrene-poly-4-vinylpyridine (PS-b-P4VP) block copolymer was used as the research object, DMF as annealing solvent, atomic force microscopy (AFM) and transmission electron microscopy (TEM) The effect of solvent removal rate on the phase morphology of the thin film was observed at the later stage of solvent annealing and it was found that the morphology of the film can be effectively controlled by changing the solvent removal rate.When the film thickness is 35 nm, , The reversed columnar phase structure with PS as dispersed phase was formed. When the volatilization rate of the solvent was decreased, the ring morphology with PS as the dispersed phase was formed. When the volatilization rate was further decreased, a step-like However, when the film thickness is 55 nm, the normal columnar phase structure with P4VP as the dispersed phase is formed in the post-annealing thin film, and the morphology of the thin film phase changes little at the same solvent removal rate.