日本高能加速器研究所开发成功几乎所有金属都能在室温下沉积于基板上的薄膜成形方法──“静电作用法”。此法是用两个对向的电极夹住一玻璃环，在该玻璃环中放入待沉积的金属粉末，在真空状态下施加直流电压，待电压增高到某一值时金属粉末即开始静电振动，大约历时１ｈ左右 Japan Institute of High Energy Accelerators has successfully developed a thin film forming method that almost all metals can be deposited on a substrate at room temperature - the “electrostatic action method.” In this method, a glass ring is sandwiched between two opposite electrodes, a metal powder to be deposited is placed in the glass ring, and a DC voltage is applied in a vacuum state. When the voltage is increased to a certain value, the metal powder starts to be electrostatically charged Vibration, about lasted about 1h