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对离子注入制备Al_2O_3涂层中的氧元素分布进行了分析,研究在不同加速电压、剂量离子注入参数下,氧元素的深度、浓度的变化规律,并根据相关规律对涂层进行了优化。结果表明:在单一加速电压下,氧元素分布符合准高斯分布;加速电压的增大将使氧元素分布深度变大,但浓度分布梯度将变小。在剂量达到8×1017ions/cm~2及以上时,由于离子注入使晶粒纳米化,氧元素浓度分布变得很均匀。通过以上分析,进行了叠加注入优化氧元素分布,具体参数为:加速电压分别为30,50,70 k V,剂量分别为2.5×1017,2×1017,3.5×1017ions/cm~2,测试结果表明,浓度分布更均匀,阻氚性能也得到较大提高。
The distribution of oxygen in ion-implanted Al 2 O 3 coating was analyzed to study the variation of oxygen concentration and depth under different accelerating voltage and dose ion implantation parameters. The coating was optimized according to the relevant laws. The results show that under the single accelerating voltage, the distribution of oxygen is in accordance with the quasi-Gaussian distribution. When the accelerating voltage is increased, the depth of oxygen distribution becomes larger but the gradient of concentration distribution becomes smaller. At doses up to 8 × 10 17 ions / cm 2 and above, the oxygen concentration distribution became uniform due to the nanocrystallization of the particles by ion implantation. Through the above analysis, the superposition injection was carried out to optimize the distribution of oxygen elements. The specific parameters were as follows: the accelerating voltages were 30,50,70 kV and the doses were 2.5 × 1017,2 × 1017,3.5 × 1017ions / cm ~ 2 respectively. The test results Show that the concentration distribution more uniform, tritium resistance performance has also been greatly improved.