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针对参量振荡过程中铌酸锂表面的增透薄膜的损伤问题,采用了XRD光谱法和形貌观测法对激光诱导薄膜损伤的形貌及其物理过程进行了深入地分析。观测发现:薄膜损伤点的特征是膜面出现凹陷的点坑,周围分散着由厚到薄变化的沉积层,XRD光谱检测显示出现了薄膜材料的晶化。利用杂质缺陷诱导薄膜损伤模型对以上损伤的形貌成因进行了分析。研究表明:杂质粒子对激光脉冲能量的强烈吸收会引起邻近光学材料的迅速熔化、汽化和电离,形成复杂物态结构混合物;在激光等离子体冲击波作用下,混合物发生喷溅扩散形成凹陷坑。在扩散冷却过程中沉积物会发生结晶,X射线衍射显示出薄膜材料SiO2晶态的衍射峰。
Aiming at the damage of the antireflection film on the surface of lithium niobate during the parameter oscillation, the morphology and physical process of laser induced thin film damage were analyzed by XRD and morphology observation. The observation shows that the damage point of the film is characterized by the presence of depressed pits on the surface of the film and the deposition of layers varying in thickness from thin to thin. The XRD spectrum shows that the film material is crystallized. The impurity induced thin film damage model was used to analyze the morphology of the above damage. The results show that the strong absorption of the laser pulse energy by the impurity particles causes the rapid melting, vaporization and ionization of the adjacent optical materials, resulting in the formation of a complex mixture of state structures. In the laser plasma shock wave, the mixture splashes to form a depression. During the diffusion cooling process, the deposit will crystallize, and the X-ray diffraction shows the diffraction peak of SiO2 crystalline state of the thin film material.