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在分子动力学研究的基础上建立了气相沉积原子的沉积动力学物理模型,并根据在局域环境下的表面原子扩散模型,通过运动学MonteCarlo方法研究了Au/Au(100)外延薄膜的初期生长过程,探讨了薄膜外延生长随基体温度的变化.通过气相外延沉积的计算机模拟发现:单原子扩散过程在薄膜生长中起着极为关键的作用.当薄膜生长温度低于单原子的扩散温度时,表面原子的成核和表面岛的生长主要是由沉积原子的空间随机性和表面原子密度增加而决定的;随着薄膜生长温度的提高,薄膜的生长模式则取决于单原子的层内扩散和层间扩散的竞争
Based on the study of molecular dynamics, a physical model of deposition dynamics of vapor deposition atoms was established. According to the surface atom diffusion model in local environment, the initial stage of Au / Au (100) epitaxial film was studied by the kinematic Monte Carlo method Growth process, the change of film epitaxial growth with substrate temperature was discussed.The computer simulation of vapor phase epitaxy found that the single atom diffusion process plays a crucial role in the film growth.When the film growth temperature is lower than the diffusion temperature of single atom The nucleation of surface atoms and the growth of surface islands are mainly determined by the spatial randomness of depositional atoms and the increase of surface atom density. With the increase of the film growth temperature, the growth mode of the film depends on the intra-single-layer diffusion And the proliferation of competition between layers