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实验分别采用5种不同的沉积速率(0.44,0.30,0.18,0.08和0.04nm/s)制备了金属银薄膜,膜系结构为基底/Al2O3/Ag/Al2O3/Air。光谱测试结果表明,沉积速率0.18nm/s的样品具有最高的平均反射率。采用X射线衍射(XRD)仪分析了5个样品的X射线衍射谱。银膜择优取向(111)晶向,0.18nm/s的样品衍射峰强度最大、衍射峰半峰全宽最小、晶粒尺寸最大,说明此沉积速率下结晶程度最高。过快或者过慢的沉积速率会导致银膜结晶程度下降,从而导致平均消光系数增大和反射率下降。在实验条件下,银膜的最佳沉积速率在0.18nm/s附近,此时制备的银膜具备最好的结晶程度和最高的反射率,此结论不同于传统意义上认为热蒸发银膜速率越快,成膜质量越高、光谱特性越好的观点。
In this experiment, metallic silver thin films were prepared using five different deposition rates (0.44, 0.30, 0.18, 0.08 and 0.04 nm / s) respectively. The film structure was based on Al2O3 / Ag / Al2O3 / Air. The spectral test results show that the sample with the deposition rate of 0.18 nm / s has the highest average reflectance. The X-ray diffraction spectra of five samples were analyzed by X-ray diffraction (XRD). The preferred orientation (111) crystallographic orientation of the silver film, the diffraction peak intensity of the 0.18nm / s sample is the largest, the full width at half maximum of the diffraction peak is the smallest, and the grain size is the largest, indicating that the crystallinity is the highest at this deposition rate. A too fast or too slow deposition rate leads to a decrease of the crystallinity of the silver film, leading to an increase of the average extinction coefficient and a decrease of the reflectivity. Under the experimental conditions, the optimal deposition rate of silver film is about 0.18nm / s, the silver film prepared at this time has the best degree of crystallization and the highest reflectivity. This conclusion is different from the traditional sense that the rate of thermal evaporation silver film The faster, the higher the quality of the film, the better the spectral characteristics.