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本文对近几年来等离子体原子发射光谱 ( ICP-AES)和等离子体质谱 ( ICP-MS)在新型陶瓷材料分析中的应用进行了评述 ,讨论了应用 ICP-AES/MS技术测定陶瓷材料中痕量杂质的各种进样技术。引用文献 60篇。
In this paper, the applications of ICP-AES and ICP-MS in the analysis of new ceramic materials in recent years are reviewed. The application of ICP-AES / MS in the determination of trace of ceramic materials The amount of impurities in a variety of injection technology. Citation 60 articles.