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采用侧墙工艺技术研制深亚微米ｘ射线掩模，并在北京同步辐射装置光刻束线上进行了同步辐射ｘ射线曝光实验，初步获得了深亚微米光刻图形
Deep-submicron x-ray masks were fabricated using the sidewall technology and synchrotron radiation x-ray exposure experiments were performed on the lithographic bundles of Beijing Synchrotron Radiation Facility. The deep submicron lithography pattern