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本文介绍了一种生长磷硅玻璃(PSG)的新方法,即等离子体化学汽相淀积(PCVD),给出了一些基本试验数据,并与一般采用的常规CVD工艺作了对比.
In this paper, a new method of growing PSG (Plasma Chemical Vapor Deposition) (PCVD) is introduced. Some basic experimental data are given and compared with the commonly used conventional CVD processes.