针对X射线透射光栅摄谱仪中对高线密度聚焦变栅距光栅的需要,利用电子束光刻技术,研制了X射线透射变栅距光栅。利用变栅距光栅的自动生成宏文件程序,优化设计了变栅距光栅的版图,然后利用电子束光刻和微电镀技术在聚酰亚胺薄膜底衬上制备了X射线透射变栅距光栅。制作出中心线数为2000lp/mmX射线透射变栅距光栅,栅距变化符合设计要求。衍射效率标定的结果表明,制备的变栅距光栅在中心波长处聚焦作用明显,可以大幅提高衍射光强度和光栅的分辨本领,具有重要的应用价值。 In order to meet the need of high linear density variable pitch grating in X-ray transmission grating spectrograph, an X-ray transmissive grating with variable pitch grating was developed by electron beam lithography. By using the auto-generated macro file program with variable pitch raster, the layout of variable pitch raster is optimized. Then the electron beam lithography and micro-plating technology are used to fabricate the X-ray transmissive grating . Produced a center line of 2000lp / mm X-ray transmission grating variable grating, pitch changes in line with design requirements. The results of the calibration of diffraction efficiency show that the prepared grating with variable grating has obvious focusing effect at the center wavelength, which can greatly improve the diffraction intensity and the resolving power of the grating, and has important application value.