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重点研究了纳米尺度标准样片的光学表征方法。采用基于纳米测量机(NMM)的激光聚焦传感器(LFS)和扫描白光干涉传感器(SWLIS)分别对平面尺度的标准样片和台阶标准样片进行了测量、分析与比较。实验结果表明,利用该纳米测量机LFS对标定值为3μm的TGZ1一维栅格样片进行测量,其扩展不确定度为4.2 nm,实现了精确表征。利用SWLIS测量方法对标定值为49.217μm的SHS8-50.0高台阶标准样板进行测量,测量不确定度分析结果为0.065 7μm,实现了采用光学检测技术跨尺度对纳米尺度精密器件和结构进行表征。扩大了基于纳米测量机光学表征方法的应用范围,有利于纳米几何量量值溯源体系的建立。
Focusing on the optical characterization of nanoscale standard samples. The standard scale and the standard step of the standard are measured, analyzed and compared respectively by LFS and SWLIS based on NMM. The experimental results show that using the nanostructer LFS to measure the one-dimensional grid sample of TGZ1 with a nominal value of 3μm, the extended uncertainty is 4.2 nm and the accurate characterization is achieved. The SWSIS measurement method was used to measure the SHS8-50.0 high-order standard sample with the calibration value of 49.217μm. The uncertainty of the measurement was 0.065 7μm. The optical detection technology was used to characterize the nanoscale precision devices and structures. Expands the application scope based on the optical characterization method of the nanometer measuring machine, and is favorable for establishing a traceability system of the nanometer geometric quantity.