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(四)表面和界面分析技术可以毫不夸张地说,近年来在集成电路以及微电子学的主要领域中取得的巨大进展,不仅是器件物理、材料及其制备和处理加工技术发展的结果,而且也是微分析技术发展的结果。实际上,无论从器件物理和材料科学的理论及基础研究开始直到制备和工艺过程的研究,还是从材料的特性测定和对表面、界面现象的了解和控制到生产流程的工艺质量检验和监控,进而直到最后的老炼和使用过程的可靠性研究、失效原因的分析都和近代微分析技术密切相关。微电子学中的许多要求,诸如材料纯度、工艺处理的清洁度、缺陷数量以及均质性等等
(D) Surface and Interface Analysis Techniques It is no exaggeration to say that the tremendous progress made in the major areas of integrated circuits and microelectronics in recent years is not only the result of advances in device physics, materials, and their processing and processing technologies, But also the result of the development of micro-analysis technology. In fact, no matter from the theoretical and basic research of device physics and material science to the research of preparation and process, but also from the characterization of materials and the inspection and monitoring of the process quality from the understanding and control of surface and interface phenomenon to the production process, And then until the final aging and use of the reliability of the study, the analysis of the causes of failure are closely related with modern micro-analysis techniques. Many requirements in microelectronics such as material purity, cleanliness of process, number of defects, homogeneity, etc.