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钽金属是一种化学性质很稳定的金属,室温下几乎不发生氧化.因而,钽金属薄膜被广泛地应用于微波混合集成电路、精密电阻、电容.由于钽的化学稳定性,其光刻腐蚀液便很难满足设计需要,目前应用的KMnO_4+KOH+H_2O刻蚀液,由于对光刻胶的严重破坏性,使光刻精度很低,工艺稳定性和重复性很不好,影响了钽金属的应用,为此我们研究得出一种新型钽薄膜光刻腐蚀液,基本解决了以上困难,现介绍如下:
Tantalum is a chemically stable metal with little or no oxidation at room temperature.Therefore, tantalum metal thin films are widely used in microwave hybrid integrated circuits, precision resistors, capacitors, etc. Due to the chemical stability of tantalum, lithographic etching It is difficult to meet the needs of liquid design, the current application of KMnO_4 + KOH + H_2O etching solution, due to the severe damage to the photoresist, the lithography accuracy is very low, the process stability and repeatability is very poor, affecting the tantalum Metal applications, for which we have come to a study of a new tantalum film lithography etching solution, the basic solution to the above difficulties are presented below: