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通过双温模型(TTM)结合Richardson-Dushman方程对多脉冲飞秒激光烧蚀铜箔的热电子发射以及温度场进行了数值模拟。在模拟的过程中充分考虑了随着飞秒激光脉冲个数的改变,铜箔对飞秒激光的反射率、表面吸收率和表面吸收系数的变化等因素,部分改写了飞秒激光光源项,从而实现了多脉冲飞秒激光烧蚀铜箔的热电子发射和温度场的动态数值模拟。数值模拟发现,随着脉冲个数的增加和脉冲间隔的减小,铜箔表面的反射率和表面吸收系数将明显减小,表面吸收率将明显增大,这一变化对铜箔的电子发射以及多脉冲飞秒激光照射下铜箔的温度场具有重要影响;而随着距铜箔表面深度的增加,这些影响将逐渐减小。
The thermo-electron emission and temperature field of the multi-pulse femtosecond laser ablated copper foil were numerically simulated by the dual-temperature model (TTM) combined with the Richardson-Dushman equation. In the process of simulation, the femtosecond laser light source term is partially rewritten due to the change of the number of femtosecond laser pulses, the reflectance of the copper foil on the femtosecond laser, the change of the surface absorption coefficient and the surface absorption coefficient, In order to realize the dynamic numerical simulation of the thermionic emission and temperature field of multi-pulse femtosecond laser ablated copper foil, The numerical simulation shows that with the increase of pulse number and the decrease of pulse interval, the reflectance and surface absorption coefficient of copper foil will be obviously reduced and the surface absorption rate will be obviously increased. The change of copper foil electron emission As well as the temperature field of the copper foil under multi-pulse femtosecond laser irradiation. These effects will gradually decrease with the increase of the depth from the copper foil surface.