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5. Influence of Argon Gas Pressure on the ZnO∶Al Films Deposited on Flexible TPT Substrates at Room Tem

Influence of Argon Gas Pressure on the ZnO∶Al Films Deposited on Flexible TPT Substrates at Room Tem

来源 :武汉理工大学学报（材料科学版）（英文版） | 被引量 : 0次 | 上传用户：ken99win

【作 者】

：

WANG Xiaojing LEI Qingsong YUAN Junming ZHOU Wenli YU Jun 

【机 构】

：

Department of Electronics Science & Technology, Huazhong University of Science & Technology, Wuhan 4

【出 处】

：

武汉理工大学学报（材料科学版）（英文版）

【发表日期】

：

2011年1期

【关键词】

：

Al-doped ZnO (ZnO∶Al) flexible substrate magnetron sputtering argon gas pressure 

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