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以Ti(SO4)2为钛源采用阴极电沉积法在导电玻璃上生成TiO2薄膜。采用单因素法分析了电压、pH、时间等因素对阴极电沉积TiO2薄膜的影响,确定了电沉积液最佳配方和工艺条件,并采用XRD、SEM、TG-DTA等分析手段进行了表征。实验结果表明:阴极电沉积法制备TiO2薄膜的最佳配方及工艺条件为10mL Ti(SO4)2,3mLH2O2,2mLHNO3,8mL NH3.H2O,20mL H2O,pH为1.5,电压为3.5V,沉积时间为20min。在此条件下,在导电玻璃上能够形成一层均匀TiO2薄膜,经XRD检测该膜层晶型为锐钛矿,该膜层可应用于染料敏化太阳能电池、光催化等领域。
Ti (SO4) 2 was used as the source of titanium cathode electrodeposited TiO2 film on the conductive glass. The influence of voltage, pH, time and other factors on the electrodeposition of TiO2 thin film was analyzed by single factor method. The optimum formulation and technological conditions of the electrodeposited solution were determined. XRD, SEM, TG-DTA and other analytical methods were used to characterize. The experimental results show that the optimum conditions for the preparation of TiO2 film by cathodic electrodeposition are as follows: 10mL Ti (SO4) 2,3mLH2O2, 2mL HNO3, 8mL NH3.H2O, 20mL H2O, pH 1.5, voltage 3.5V, deposition time 20min. Under this condition, a uniform TiO2 thin film can be formed on the conductive glass. The crystalline form of the TiO2 film is anatase by XRD. The film can be applied in the fields of dye-sensitized solar cells and photocatalysis.