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聚合物消融产生的显微结构高强度准分子激光照射高分子材料引起的爆炸性光化学反应,使高分子化合物分解,从而受到蚀刻,称为聚合物消融。受照聚合物表面形成特异的显微结构可望作为表面改性技术利用。扫描电镜照片显示,用Xecl准分子激光(波长:308nm;强度:750mJ/cm~2·脉冲:100脉冲)照射聚醚砜会形成显微结构。图案随照射角度(偏光度)而异,垂直照射(非偏振光束)时呈无规图案(照片a);斜向照射时由于偏光的影响得到光栅状的图案(照片b)。显微结构的间隔依赖于照射通量,
Microscopic structure caused by polymer ablation High-intensity excimer laser irradiation of polymer materials caused by explosive photochemical reactions, the polymer compound decomposition, which is subject to etching, known as polymer ablation. The formation of a specific microstructure of the irradiated polymer surface is expected to be utilized as a surface modification technique. Scanning electron micrographs showed that the microstructure was formed by irradiating polyethersulfone with Xecl excimer laser (wavelength: 308 nm; intensity: 750 mJ / cm ~ 2 pulses: 100 pulses). The pattern varies depending on the irradiation angle (degree of polarization), the pattern is irregular when irradiated vertically (unpolarized beam) (Photo a), and the grating pattern is obtained due to the effect of polarization when obliquely irradiated (Photo b). The spacing of the microstructures depends on the irradiation flux,