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EB-PVD是以高能电子束为热源的一种蒸发镀膜技术。在真空的环境下,高能离子束轰击靶材(金属,陶瓷等),使其融化、升华、蒸发,最后沉积在基片上。由于EB-PVD技术具有蒸发和沉积速率高,涂层致密,化学成分易于精确控制,可得到柱状晶组织,无污染,热效率高,基片与薄膜之间有较强的结合力等诸多优点,已被广泛应用于国防和民用领域。本文介绍了EB-PVD技术在制备热障涂层时优势、不足与改进措施。
EB-PVD is a high-energy electron beam as a heat source evaporation coating technology. In a vacuum environment, high-energy ion beams bombard targets (metals, ceramics, etc.) to melt, sublime, evaporate and finally deposit on the substrate. EB-PVD technology has the advantages of high evaporation rate and deposition rate, dense coating and precise control of chemical composition, and can obtain the advantages of columnar crystal structure, no pollution, high thermal efficiency, strong binding force between the substrate and the thin film, Has been widely used in national defense and civilian areas. This article describes the advantages, disadvantages and improvements of EB-PVD technology in the preparation of thermal barrier coatings.