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提出用铝取代银作为寻址电极,氧化铝取代玻璃粉作为其上介质层的新型等离子体显示器(PDP)电极单元,对单项工艺进行了优化,并形成了完整可行的整体工艺路线,有望为PDP生产成本的降低提供一条新的技术途径。选用非连续磁控溅射和光刻-刻蚀工艺制备铝电极,阳极氧化工艺制备氧化铝介质层。用扫描电子显微镜对铝膜、氧化铝介质层及电极单元的整体形貌进行了表征;分别对所制备的铝电极的导电性能和氧化铝介质层的耐击穿性能进行了测定,结果表明在优化的实验条件下铝电极电阻率可以达到5.0×10-8Ω·m,氧化铝耐击穿强度大于100 V/μm,完全可以满足实际应用的技术要求。
A new type of plasma display (PDP) electrode unit with aluminum instead of silver as the addressing electrode and aluminum oxide instead of glass frit as its dielectric layer is proposed to optimize the individual process and to form a complete feasible overall process route, which is expected to be PDP production costs to reduce the provision of a new technical approach. Aluminum electrodes were prepared by non-continuous magnetron sputtering and photolithography-etching process, and anodized aluminum oxide dielectric layers were prepared. The overall morphology of the aluminum film, the alumina dielectric layer and the electrode unit was characterized by scanning electron microscopy. The electrical conductivity of the prepared aluminum electrode and the breakdown resistance of the alumina dielectric layer were measured respectively. The results show that in the Under the optimal experimental conditions, the resistivity of aluminum electrode can reach 5.0 × 10-8Ω · m and the breakdown strength of alumina is more than 100 V / μm, which can meet the practical application requirements.