本文拟定了在HClO_4-HCl-NaAc介质中,以EDTA-Zn作缓冲络合剂掩蔽合金基体Fe~(3+)、Ni~(2+)、以苦杏仁酸-H_2O_2掩蔽Ti~(4+)、Al~(3+)等离子,在pH2～2.5范围内用对乙酰基偶氮胂直接测定高温合金中微量铺的新方法。Cr~(3+)干扰测定,必须除去,Ni~(2+)与EDTA形成蓝色络合物,以相同钢种的参比液抵消其影响。试剂与铈形成的蓝绿色络合物极其稳定,方法简便、快速。已用于各类高温合金中微量铈的直接测定,结果甚为满意。 In this paper, we prepared a new method to mask Fe ~ (3 +) and Ni ~ (2+) with EDTA-Zn as buffer complexing agent in HClO_4-HCl-NaAc medium and masking Ti ~ (4+ ), Al ~ (3+) ions in the range of pH2 ~ 2.5 with p-acetylarsenazo arsenazo direct determination of high-temperature alloys in the micro-shop. Cr ~ (3 +) interference measurement, must be removed, Ni ~ (2+) and EDTA form a blue complex, with the same steel reference solution to offset its effect. Reagent and cerium blue-green complex formed extremely stable, the method is simple and fast. Has been used for various types of high-temperature alloys in the direct determination of cerium, the results are very satisfied.