报道了一种利用偏压恒流等离子辅助热丝化学气相沉积方法在硅基板上制备大面积均匀纳米金刚石薄膜的新工艺 ,在不同沉积条件下研究了纳米金刚石薄膜的成核和生长过程 ,并通过扫描电镜、拉曼光谱和表面粗糙度测试仪观察了纳米金刚石薄膜的结构特征。最后成功制备了直径 10 0mm、平均晶粒尺寸 10nm的光滑纳米金刚石薄膜。 A novel process of preparing large-area uniform nano-diamond films on silicon substrates by using bias constant current plasma-assisted hot filament chemical vapor deposition was reported. The nucleation and growth processes of the nano-diamond films were studied under different deposition conditions. The structural characteristics of nanocrystalline diamond films were observed by scanning electron microscopy, Raman spectroscopy and surface roughness tester. Finally, a smooth nano-diamond thin film with a diameter of 10 mm and an average grain size of 10 nm was successfully prepared.