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深亚微米尺度(90 nm)下,对在金属Ni膜中加入微量Pt,再经过高温退火形成NiSi.对该固相反应的反应序列进行了研究.研究发现Ni2Si-to-NiSi转变温度由300℃提高到350℃;NiSi-to-NiSi2转变温度由640℃提高到775℃;而且,NiSi薄膜的形貌在750℃才开始发生Agglomeration现象.
The Ni2Si-to-NiSi transition temperature was found to be from 300 to 300 nm in the Ni submicron (90 nm) ℃ to 350 ℃; the transition temperature of NiSi-to-NiSi2 increased from 640 ℃ to 775 ℃; moreover, the morphology of NiSi film started to agglomeration at 750 ℃.