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利用射频磁控溅射技术在不同工作气压和不同基底偏压条件下在Si(100)基底上设计合成了ZrB2/AlN纳米多层膜。利用X射线衍射、扫描电子显微镜、纳米力学测试系统和表面轮廓仪分析了工作气压和基底偏压对薄膜的微结构和机械性能的影响。结果表明:大部分ZrB2/AlN多层膜的纳米硬度与弹性模量值高于两种个体材料的混合值。当工作气压为0.4Pa,基底偏压为-60 V时,制备的薄膜具有最高的硬度(36.8 GPa)、最高的弹性模量(488.7 GPa)和最高的临界载荷(43.6 mN)。基底偏压的升高和工作气压的降低会使沉积粒子的动能提高,引起薄膜表面原子迁移率提高,导致薄膜的原子密度提高,起到位错钉扎的作用,晶粒尺度也被限制在纳米尺度,这些均对提高薄膜的硬度和抗裂强度起到了作用。
The ZrB2 / AlN multilayered films were designed and synthesized on Si (100) substrates by RF magnetron sputtering at different operating pressures and different substrate biases. The effects of working pressure and substrate bias on the microstructure and mechanical properties of the films were analyzed by X-ray diffraction, scanning electron microscopy, nanomechanical testing system and surface profiler. The results show that the nano-hardness and elastic modulus of most ZrB2 / AlN multilayer films are higher than those of two kinds of individual materials. The films prepared have the highest hardness (36.8 GPa), the highest elastic modulus (488.7 GPa) and the highest critical load (43.6 mN) when the operating pressure is 0.4 Pa and the substrate bias is -60 V. The increase of substrate bias and working pressure will increase the kinetic energy of the deposited particles, resulting in the increase of atom mobility on the surface of the film, resulting in the increase of the atomic density of the film and the pinning of dislocations. The grain size is also limited to nanometers Scale, these are to improve the film hardness and crack strength played a role.