较早发表的论述等离子(或离子)渗碳的文章已经指出在直流辉光放电等离子体中渗碳具有种种优点,其中主要有(1)渗层特别均匀,即便是深的凹槽和盲孔也不例外。(2)采用单组元气体在比“真空”渗碳或减压渗碳低得多的压力下可达到很高的渗碳速度。渗层深度之所以均匀可能是由于象离子氮化那样,放电过程始终在电流一电压特性曲线的“异常”辉光区进行,在该区域阴极(工件)表面全部被辉光复盖所致。尽管渗碳气体的分压很低,但由于它 Earlier published articles dealing with plasma (or ionic) carburization have pointed out the advantages of carburizing in direct current glow discharge plasma, among which are primarily (1) a particularly uniform layer of penetration, even deep grooves and blind holes No exception. (2) High carburization rates can be achieved with single component gases at much lower pressures than “vacuum” carburization or decompression carburization. The reason for the uniform layer depth is probably due to the fact that, like ion nitriding, the discharge process is always carried out in the “abnormal” glow region of the current-voltage characteristic, where the cathode (workpiece) surface is all covered by glow. Although the partial pressure of carburizing gas is low, it is due to it