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,Crystalline silicon surface passivation investigated by thermal atomic-layer-deposited aluminum oxi
[期刊论文] 作者：Cai-Xia Hou,Xin-He Zheng,Rui Jia,Ke Tao,San-Jie Liu,Shuai Jiang,Peng-Fei Zhang,Heng-Chao Sun,Yong-Tao,
来源：中国物理B（英文版） 年份：2017
Atomic-layer-deposited (ALD) aluminum oxide (Al2O3) has demonstrated an excellent surface passivation for crystalline silicon (c-Si) surfaces,as well as for hig...
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