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[期刊论文] 作者：FanWang,HailiangLu,QingyunZhang,AnatolyBurov,
来源：ChineseOpticsLetters 年份：2012
A novel angle-resolved scatterometer based on pupil optimization for feature profile measurement in a photolithography process is proposed. The impact of image sensor errors is minimized by optimizing the intensity distribution of the incid......
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