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[期刊论文] 作者:Siche Dietmar,Rost Hans-Joachim,Schulz Tobias,Albrecht Martin,,
来源:稀有金属材料与工程 年份:2011
Chemical mechanical polishing (CMP) was used to etch various GaN materials, such as GaN layers on sapphire and silicon carbide substrates grown by metal-organic...
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