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[期刊论文] 作者:Liu Cheng-Sen(刘成森),Wang Yan-Hui(王艳辉),Wang De-Zhen(王德真), 来源:中国物理(英文版) 年份:2005
One important parameter for the plasma source ion implantation (PSII) process is the target temperature obtained during the surface modification. Because the po...
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