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[会议论文] 作者:Ye Yuhua,Zhang Li,Zhang Qianqian,Yu Qiuxia,Xu Xiangmin, 来源:中华医学会第十五次全国医学遗传学学术会议、中国医师协会医学遗传医师分会第一届全国学术会议暨2016年浙江省医学遗传学年会 年份:2016
[会议论文] 作者:GONGDONG YU,QIUXIA SUN,ZONGTAO ZHANG,LIN DONG,XIAOLIN JIA,GUOSHENG SHAO, 来源:10th IUPAC International Conference on Novel Materials and t 年份:2014
[会议论文] 作者:GONGDONG YU,QIUXIA SUN,ZONGTAO ZHANG,LIN DONG,XIAOLIN JIA,GUOSHENG SHAO, 来源:10th IUPAC International Conference on Novel Materials and t 年份:2014
CeO2-based polishing powder has become one of the most promising polishing powders used in chemical mechanical polishing(CMP)industry.However,due to its high hardness,the as-obtained CeO2 powders usua...
[会议论文] 作者:Xiong Fu,Yang Qi,Chen Dong,Chen Danna,Liu Cuixian,Liu Yanhui,Yu Qiuxia,Ye Yuhua,Tian Zhihui,Shan Xuan, 来源:中华医学会第十五次全国医学遗传学学术会议、中国医师协会医学遗传医师分会第一届全国学术会议暨2016年浙江省医学遗传学年会 年份:2016
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