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[期刊论文] 作者：ZHONGBo－qiang,
来源：半导体光子学与技术：英文版 年份：1999
A new catalytic chemical vapor process for depositing silicon nitride films using silane hydrazine gaseous mixture is described.This system can be useful at a t...
[期刊论文] 作者：ZHONGBo－qiang,
来源：半导体光子学与技术：英文版 年份：1999
Doped micro-crystalline silicon films are deposited at temperatures as low as 400℃ by the catalytic chemical vapor deposition method using a silane and hydroge...
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