Nanolithography on Defects-Incorporated DNA Origami Template through DNA-Selective Copper Metallizat

来源 :International Conference on Nanoscience & Technology,China 2 | 被引量 : 0次 | 上传用户:jia343212539
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  Over the last two decades, the speed of integrated circuits has remarkable increased but the feature size has rapidly decreased, principally because of the improvements in the lithographic techniques used to create microstructures.As the circuit components become smaller,the use of optical lithographic techniques becomes much more complicated and expensive.
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