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The Al-Cr-N hard film for tribological application is commonly prepared by sputtering from AlCr alloy target in Ar+N2 mix gas atmosphere.The general method to manufacture Al-rich Al-Cr-N film is co-sputtering from Al and Cr target which easily obtain an arbitrary composition.However,the AlCr alloyed target with high Al ratio is difficult to be produced by melting technology owing to brittle intermetallic compound formation.In this study,the AlCr alloy target would be manufactured by powder metallurgy process which included hot pressing (HP),hot isostatic pressing (HIP) and novel powder metallurgy forming (NPMF) which developed by Solar Applied Materials Technology Corp..The results show higher HP temperature can obtain dense target but lots of AlCr intermetallic compound formation result in the target with poor mechanical property which is easy to cause the cracks on target and also mass high particles generation during sputtering process.Lower HP temperature can inhibit compound formation but results in lower density.The HIP method also has the similar trend as HP process.In order to achieve high density and low percentage of compounds formation,NPMF process which developed by ourselves has been employed to produce high quality AlCr target.The results indicates good quality AlCr alloy target with high density and free intermetallic compound formation can successfully achieved using NPMF process.Further,the Al-Cr-N film deposited from AlCr alloy target by NPMF was characterized by SEM,XRD and hardness tests.The results demonstrated it has comparative mechanical properties as commercial film.