【摘 要】
：
Laser CVD (LCVD) using a high power laser is able to prepare thick films at a sufficiently high deposition rates with significant orientation, and new struc
【机 构】
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Wuhan University of Technology, China
【出 处】
：
The 9th International Conference on Thin Film Physics and Ap
论文部分内容阅读
Laser CVD (LCVD) using a high power laser is able to prepare thick films at a sufficiently high deposition rates with significant orientation, and new structure.Highly oriented <111> and <110> β-SiC films were prepared by laser chemical vapor deposition using a diode laser (wavelength =808 nm) and a CO2 laser (wavelength =10600 nm).
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