【摘 要】
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In the process of plasma chemical vapor deposition of thin films,it is important to understand the effect of plasma discharging characteristics on morphology,structure and properties of the deposited
【机 构】
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College of Science, Donghua University, Shanghai 201620, China
【出 处】
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13th Asia-Pacific Conference on Plasma Science and Technolog
论文部分内容阅读
In the process of plasma chemical vapor deposition of thin films,it is important to understand the effect of plasma discharging characteristics on morphology,structure and properties of the deposited films.In this paper,we have discussed the system of Ar/O2/TiCl4 reactive plasma at atmospheric pressure at 13.56 MHz in different power and O2,TiCl4 flow by observing discharging morphology,Ⅰ/V curves and optical emission spectrometer.It has shown that discharge morphology is uniform,and no filament discharge can be seen.
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