【摘 要】
：
Fuel cells have been regarded as one of the most promising candidate for next-generation power sources owing to their high efficiencies,fast start-up and low emission and are well suited for transport
【机 构】
：
School of Chemical Engineering and Technology,Harbin Institute of Technology,No.92 West-Da Zhi Stree
【出 处】
：
第16届全国氢能会议暨第8届两岸三地氢能研讨会
论文部分内容阅读
Fuel cells have been regarded as one of the most promising candidate for next-generation power sources owing to their high efficiencies,fast start-up and low emission and are well suited for transportation and portable electronics.
其他文献
LiAlH4 作为一种典型的配位金属氢化物,具有较高的储氢容量(10.5 wt％),从而受到人们广泛的研究,但较高的放氢温度及较慢的放氢动力学限制了其在实际中的应用[1].本文采用溶胶凝胶法于室温下将40 wt％TiO2 颗粒原位负载到分级孔的多孔碳中,颗粒大小约10 nm,进而将不同比例的LiAlH4 浸渍到TiO2/C 复合物中.
近年来,直接乙醇燃料电池(DEFC)由于绿色环保、安全便携,燃料乙醇来源广泛、能量密度高等优势,逐渐引起人们的关注。而乙醇的电氧化过程复杂,中间产物多,C-C 键难以断裂,使得乙醇经过12 电子转移实现完全氧化生成二氧化碳的过程不易进行,造成能量损失。因此,制备一种新型高效的催化剂成为必然。
以直接涂布方式将催化剂加载于直子交换膜上而制作成三层式膜电极,其中直子交换膜采用厚度为20 微米、具有加强筋之全氟磺酸模材,而铂金催化剂加载量阴阳二极合计为0.6mg/cm2,气体扩散层采用SGL 24BC,气密垫圈厚度为各边160 微米.
raphene has risen as a new shinning star in the horizon on the path of scientists searching for new material.Its potential applications include basic electronic components,microelectronics components
催化剂的性能直接影响着燃料电池的性能与效率,碳材料广泛用于作为燃料电池催化剂载体,一旦碳载体发生腐蚀,碳表面将产生含氧官能团[1-3],削弱催化剂颗粒与碳载体的相互作用,使得催化剂颗粒团聚与迁移[1,4]。
直接甲酸燃料电池(DFAFC)作为高效、绿色可持续新动力能源被人们所亲睐。但甲酸电氧化过程较为复杂、产生的CO 易使催化剂中毒，因此制备高效、可行的催化剂对于DFAFC 的广泛应用至关重要。
Direct methanol fuel cell(DMFC)is a positive researching technique because of the high specific energy,environmentally friendly and convenient manipulation.
低温燃料电池是一种高效的能源利用方式，很有希望应用在清洁能源汽车、分布式电源等方面。当前，影响燃料电池大规模应用的主要瓶颈是阴极氧还原(ORR)必须使用价格昂贵的铂催化剂。
Graphitic carbon nitride(g-C3N4)has been demonstrated as a promising support material for Pt-based NPs due to its lower price,excellent stability in acidic environments and the abundant Lewis acid and
The state-of-art nickel-based SOFC anode shows an excellent performance when operated on H2 fuel.However,when hydrocarbon fuels are used,the Ni-based anode suffers from carbon deposition caused by C-H