目前,随着大型计算机和微处理机市场的扩大,对 MOS 大规模集成电路的高集成度和高速化的要求也日益增强。为满足这些要求,从器件结构的观点来看,DMOS和 VMOS 器件的研制工作近来特别活跃起来。另外,从工艺设备方面看,还进行用电子束及 X 射线的掩模制备和图形曝光的研制工作。最近,对于各种直接驱动显示装置用的 MOSLSI,还强烈地提出了耐高压的要求。再则,作为 MOSLSI 的大的市场之一,还有实际应用于汽车工业的问题。MOSLSI 在汽车工业方面的应用,不 At present, with the expansion of the markets for mainframe computers and microprocessors, there is an increasing demand for the high level of integration and speeding up of MOS large-scale integrated circuits. In order to meet these requirements, the research and development of DMOS and VMOS devices have recently become particularly active from the standpoint of device structure. In addition, from the process equipment point of view, but also for electron beam and X-ray mask preparation and graphic exposure of the development work. Recently, MOSLSIs for various types of direct-driven display devices have also been strongly demanded for high voltage resistance. And then again, as one of MOSLSI’s big markets, there is a real problem with the automotive industry. MOSLSI in automotive applications, no