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采用粒状渗剂分别在渗硼硅温度为850、900、950℃,保温时间为2、8 h的工艺参数下对纯镍表面进行固体渗硼硅处理。用光学显微镜(OM)对渗层横断面进行了显微组织观察,用显微硬度计测试渗层的硬度分布,用M200型磨损试验机研究未渗硼硅和渗硼硅纯镍的耐磨性,采用循环氧化试验研究未渗硼硅和渗硼硅纯镍的抗高温氧化性。结果表明,纯镍渗硼硅后,渗层为硅化物层和硼化物层,且硅化物和硼化物的显微硬度都大于基体硬度,渗层厚度随着渗硼硅时间和温度的增加而增加,其范围约为36~237?m,用X射线衍射仪(XRD)分析出渗层为硼化物层(Ni2B)和硅化物层(Ni3Si、Ni5Si2和Ni2Si)。磨损试验结果表明渗硼硅后试样的耐磨性得到提高。抗高温氧化试验结果显示未渗硼硅纯镍试样抗高温氧化性优于渗硼硅后纯镍试样。
The surface of pure nickel was treated with solid borosilicate silicon by using granular permeation agent under the technological parameters of boronizing temperature of 850, 900, 950 ℃ and holding time of 2, 8 h respectively. Microstructure observation of the cross-section of the coating layer was carried out with an optical microscope (OM). The hardness distribution of the coating layer was measured with a microhardness tester. The wear resistance of the boron-free silicon and boronized pure nickel was investigated using a M200 wear tester Cyclic oxidation test was used to study the high temperature oxidation resistance of non-borosilicate and boro-doped pure nickel. The results show that the pure nickel is boride silicon, the diffusion layer silicide layer and boride layer, and the silicide and boride microhardness are greater than the substrate hardness, the diffusion layer thickness with boride silicon time and temperature increases And its range is about 36 ~ 237μm. The diffusion layer is boride layer (Ni2B) and silicide layer (Ni3Si, Ni5Si2 and Ni2Si) by X-ray diffractometer (XRD). The wear test results show that the wear resistance of borosilicate samples is improved. The results of high temperature oxidation test showed that the high temperature oxidation resistance of non-borosilicate pure nickel samples is better than that of pure boron samples after boronizing silicon.