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用微波等离子体增强化学气相沉积方法(MPECVD),利用氢气和甲醇的混合气体,在硅片上沉积出纳米晶粒的金刚石薄膜。用扫描电子显微镜(SEM)、拉曼光谱(Raman)、原子力显微镜(AFM)及扫描隧道显微镜(STM)对薄膜的晶粒平面平整性及纯度进行了表征。通过SEM发现,提高甲醇浓度或降低沉积温度可以减小金刚石膜的晶粒尺寸。拉曼光谱显示薄膜中确实存在纳米晶粒的金刚石,并且薄膜的主要成分为金刚石。用AFM测得薄膜表面的粗糙度Rms<80nm,STM观测晶粒的平均尺寸在10-20nm之间。研究结果表明,用MPECVD方法,利用氢气和甲醇的混合气体是制备纳米晶粒金刚石膜的一种理想方法。
A microwave plasma enhanced chemical vapor deposition (MPECVD) method was used to deposit nanocrystalline diamond films on silicon wafers using a mixed gas of hydrogen and methanol. The surface smoothness and purity of the films were characterized by SEM, Raman, atomic force microscopy (AFM) and scanning tunneling microscope (STM). It is found by SEM that increasing the methanol concentration or decreasing the deposition temperature can reduce the grain size of the diamond film. Raman spectroscopy showed that there was indeed nanocrystalline diamond in the film, and the major component of the film was diamond. The roughness Rms <80nm of film surface was measured by AFM. The average grain size of STM was between 10-20nm. The results show that the use of MPECVD method, the use of hydrogen and methanol mixed gas is prepared nanocrystalline diamond film is an ideal method.