《离子辅助蒸发新工艺研究》课题于1991年6月7日通过院级科研项目鉴定。这一课题是兵器工业总公司下达的,由仪器工程系严一心副教授负责完成。离子辅助蒸发新工艺以新研制出的、各项综合指标具有国际先进技术水平的第二代宽束冷阴极离子源为关键设备,采用多离子束斑合成方法,方便地实现了大束斑及复杂形状束斑的合成。它可以利用同一种离子源,在不同规格的真空镀膜机上,进行离子辅助蒸发镀膜。采用这一新工艺镀制的多种光学膜层与常规真空热蒸发镀膜比较,可提高膜层质量,提高生产 “Ion-assisted evaporation of new technology research” project in June 7, 1991 through the hospital-level research projects identified. This issue is issued by the Ordnance Industry Corporation, by the Department of Instrument Engineering Yan Yixin associate professor responsible for the completion. Ion-assisted evaporation of the new technology The newly developed second generation wide beam cold cathode ion source with the international advanced technology of various indicators as the key equipment, the use of multi-ion beam spot synthesis method, easy to achieve a large beam spot and complex Synthesis of the shape beam spot. It can use the same ion source, in different specifications of the vacuum coating machine, ion-assisted evaporation coating. The use of a new process of plating a variety of optical coating compared with the conventional vacuum thermal evaporation coating, can improve the quality of the film, increase production